INTERNATIONAL RESEARCH JOURNAL OF SCIENCE ENGINEERING AND TECHNOLOGY

( Online- ISSN 2454 -3195 ) New DOI : 10.32804/RJSET

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CO/AL/CR LAYERED THIN FILMS RESISTIVITY

    4 Author(s):  SANTOSH KORI,S. K. GUPTA VIVAK MAHAJAN, SANTOSH KORIA, S.K. GUPTAB

Vol -  8, Issue- 1 ,         Page(s) : 38 - 44  (2018 ) DOI : https://doi.org/10.32804/RJSET

Abstract

By using electron beam gun and thermal deposition techniques in the vacuum range 6 x10-5mbar. The pure materials of 99.99% purity of Cobalt, Aluminium and Cromium multilayered films grown on glass substrates at 300K. The resistance was measured using four probe method at BARC Mumbai (30K to 300K) later resistivity, conductivity, temperature co-efficient of resistance (TCR), residual resistivity ratio (RRR) , and activation energy(Ea) were calculated. The resistivity behavior shown that the resistivity is decreased with increasing Cobalt content; resistivity is increased with increasing temperature. The data belonging to metallic region has been analyzed using the conventional power laws and it is first time this set of films have explore resistivity at low temperature.

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